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 201408121731558463.jpg 황농문 Nong-moon Hwang, Ph.D.
Materials Science , Electronic Materials
Email : nmhwang@snu.ac.kr
Mailstop : 33-212
Phone : +82-2-880-8922
Fax : +82-2-883-8197
Homepage : http://tfml.snu.ac.kr/


Ph.D : Korea Advanced Institute of Science and Technology, Department of Materials Science and Engineering
M.S : Korea Advanced Institute of Science and Technology, Department of Materials Science and Engineering
B.S : Seoul National University, Department of Metallurgical Engineering


Seoul National University, Department of Materials Science and Engineering, Professor
National Research Institute of metals, Tsukuba, Japan, Visiting Scientist
National Institute of Standards and Technology, USA, Visiting Scientist
KRISS, Senior Research Scientist

Research Interests

1. The growth mechanism of thin films, nanowires, and nanotubes based on the theory of charged nanoparticles
* Detecting charged nano-particles during CVD with a differential mobility analyzer (DMA) and a particle beam mass spectroscopy (PBMS)
* Comparison of deposition behavior between electrically floated and grounded substrates

2. Applications based on the theory of charged nanoparticles
* Low temperature deposition of crystalline Si and SiNx
* Synthesis of Si nanowires, ZnO nanowires, GaN nanowires, and CNTs

3. Microstructure control of films and nanostructures by applying the electric bias during deposition
* DC and AC biases4. The theory of solid-state wetting as a mechanism of secondary recrystallization of metals* Computer simulations for secondary recrystallization 
* Goss selective growth in Fe-3%Si steel 
* The role of sub-boundaries in secondary recrystallization

Selected Publications

1. Patents
* Method of depositing films using bias, (KOR 10-0846718-0000) (2008) 
* Method of forming silicon nitride at low temperature, charge trap memory device comprising crystalline nano dots formed using the same and method of manufacturing charge trap memory device, (US 12/213,329) (2008) 
* Method for production of thin film and apparatus for manufacturing the same, (KOR 8793309.9) (2009) 
* Apparatus and method of films using bias and charging behavior of nanoparticles formed during chmical vapor deposition, (KOR 12/440,304) (2009)

[Total of 23 domestic and international patents]

2. Papers
* "Charged Clusters in Thin Film Growth", Intern. Mater. Rev., 49, 171 (2004) (Review Article) 
* "Effect of Interface Structure on the Microstructural Evolution of Ceramics", J. Am. Ceram. Soc. , 89, 2369 (2006) (Feature Article) 
* "Effect of Bias Applied to Hot Wires on Generation of Positive and Negative Charges during Silicon Hot Wire Chemical Vapor Deposition", J. Phys. Chem. C, 89, 2369 (2009) 
* "Abnormal Grain Growth of Goss grains in Fe-3% Si steel driven by sub-boundary-enhanced solid-state wetting: Analysis by Monte Carlo simulation", Acta Mater., 58, 4414 (2010) 
* "Charged nanoparticles in thin film and nanostructure growth by chemical vapour deposition", J. Phys. D Appl. Phys., 43, 483001 (2010) (Review Article) 
* "Low temperature deposition of crystalline silicon on glass by hot wire chemical vapor deposition", J. Cryst. Growth, 327, 57 (2011)
* "Non-Classical Crystallization of Thin Films and Nanostructures in CVD Process", CVD-InTech (2016) (Review Articles)
* "Synthesis of nanostructures using charged nanoparticles spontaneously generated in the gas phase during chemical vapor deposition", J. Phys. D Appl. Phys., 51, 463002 (2016) (Review Articles)

[Total of >200 International Journal Papers]

3. Books
* "Thermodynamics and Kinetics in the Synthesis of Monodisperse Nanoparticles", INTECH Open Access Publisher (2012)
* "Diamond: Low-Pressure Synthesis", Reference Module in Materials Science and Materials Engineering, Elsevier (2016)
* "Non-Classical Crystallization of Thin Films and Nanostructures in CVD and PVD Processes", Springer (2016)

Lab overview

1. Effect of electrostatic energy on selective deposition during CVD
* Comparison of the electrostatic energy between charged nanoparticles and conducting or insulating substrates

2. Effect of electrostatic energy on the growth of nanowires, nanosheets and films

3. Self-assembly of charged nanoparticles and charge-induced atomic diffusion* Thin film solar cells with high efficiency using low temperature crystalline Si

4. Effect of sub-boundary and precipitates on abnormal grain growth

서울 관악구 관악로 1 서울대학교, 재료공학부 31동 314호 박막및미세조직실험실 (08826)
Thin Films and Microstructure Lab., 31-314 Department of Materials Science and Engineering, Seoul National Univ., 1 Gwanak-ro, Gwanak-gu, Seoul, Korea (Zip 08826)
TEL +82-2-880-9152 (31-314), +82-2-880-8862 (30-304), +82-2-880-5511 (131-404)

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